Silicon Devices and Process Integration: Deep Submicron and Nano-Scale Technologies

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Specifications Publisher Springer Us, Springer.

Silicon Devices and Process Integration

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Popular Features. New Releases. Description Silicon Devices and Process Integration covers state-of-the-art silicon devices, their characteristics, and their interactions with process parameters. It serves as a comprehensive guide which addresses both the theoretical and practical aspects of modern silicon devices and the relationship between their electrical properties and processing conditions.

Deep Submicron and Nano-Scale Technologies

The book is compiled from the author's industrial and academic lecture notes and reflects years of experience in the development of silicon devices. Features include: A review of silicon properties which provides a foundation for understanding the device properties discussion, including mobility-enhancement by straining silicon; State-of-the-art technologies on high-K gate dielectrics, low-K dielectrics, Cu interconnects, and SiGe BiCMOS; CMOS-only applications, such as subthreshold current and parasitic latch-up; Advanced Enabling processes and process integration.

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Silicon Devices and Process Integration covers state-of-the-art silicon devices, their characteristics, and their Deep Submicron and Nano-Scale Technologies. Silicon Devices and Process Integration: Deep Submicron and Nano-Scale Technologies [Badih El-Kareh] on ykoketomel.ml *FREE* shipping on qualifying.

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